Technical advantages of 1024 beam exposure head with advanced screen

GLV â„¢ (Grating Grating â„¢) technology is derived from semiconductor manufacturing processes. The GLV â„¢ array consists of thousands of extremely small silicon-ceramic wafers. When these wafers are subjected to an external electric field, they move up and down to reflect or disperse the incident laser light, thereby turning the laser beam on or off purpose.

The laser control technology of the screen is very mature. It can illuminate the high-energy laser with high precision on the GLV â„¢ array. This technology is used by many CTP platesetters of the Thunderbolt series of screens. Advanced GLV â„¢ devices can easily Control 1024 laser beams, so that their exposure surface is often wider, the exposure area will be larger for each rotation of the exposure roller, which can double the productivity of the equipment.

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